GAO Yu 1, XIE Hong quan 1, YUAN Ming ming 2. New Type Water-developable Photosensitive Resins Containing Different Quaternary Ammonium Salt Groups[J]. Journal of Functional Polymers, 2001, 14(3): 303-306.
Citation:
GAO Yu 1, XIE Hong quan 1, YUAN Ming ming 2. New Type Water-developable Photosensitive Resins Containing Different Quaternary Ammonium Salt Groups[J]. Journal of Functional Polymers, 2001, 14(3): 303-306.
GAO Yu 1, XIE Hong quan 1, YUAN Ming ming 2. New Type Water-developable Photosensitive Resins Containing Different Quaternary Ammonium Salt Groups[J]. Journal of Functional Polymers, 2001, 14(3): 303-306.
Citation:
GAO Yu 1, XIE Hong quan 1, YUAN Ming ming 2. New Type Water-developable Photosensitive Resins Containing Different Quaternary Ammonium Salt Groups[J]. Journal of Functional Polymers, 2001, 14(3): 303-306.
New Type Water-developable Photosensitive Resins Containing Different Quaternary Ammonium Salt Groups
New type water developable photosensitive phenolic resins containing different quaternary ammonium salts were synthesized through ring opening reaction of epoxy phenolic resin with different triethylamine salts and acrylic acid. The conversions of epoxy
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