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    JIA Hui-mei, WAN Yan, CHENG Hong-xia, HAN Meng-ru, ZHANG Bin, CHEN Yu. Synthesis and Characterization of Polystyrene Covalently Modified MoS2 Broadband Optical Limiting Functional Material[J]. Journal of Functional Polymers, 2018, 31(1): 28-36. doi: 10.14133/j.cnki.1008-9357.20170607001
    Citation: JIA Hui-mei, WAN Yan, CHENG Hong-xia, HAN Meng-ru, ZHANG Bin, CHEN Yu. Synthesis and Characterization of Polystyrene Covalently Modified MoS2 Broadband Optical Limiting Functional Material[J]. Journal of Functional Polymers, 2018, 31(1): 28-36. doi: 10.14133/j.cnki.1008-9357.20170607001

    Synthesis and Characterization of Polystyrene Covalently Modified MoS2 Broadband Optical Limiting Functional Material

    • New soluble MoS2 nanosheets covalently functionalized with polystyrene (PS), MoS2-PS, was in situ synthesized. The open-aperture Z-scan results demonstrated that both the solution of MoS2-PS in DMF and the MoS2-PS/PMMA film showed superior nonlinear optical (NLO) and optical limiting (OL) responses when compared to MoS2 and MoS2/PS blends. The thin films had a much higher concentration than the solutions at the same level of linear transmission, resulting in a much larger βeff. In particular, for the MoS2-PS/PMMA film, βeff were 407.70 cm/GW at 532 nm (100.69 cm/GW for MoS2-PMMA and 116.55 cm/GW for MoS2/PS/PMMA) and 429.64 cm/GW at 1 064 nm (-48.92 cm/GW for MoS2-PMMA and 66.31 cm/GW for MoS2/PS/PMMA). A larger OL effect, with thresholds of about 0.92 GW/cm2 at 532 nm and about 1.12 GW/cm2 at 1 064 nm, was also achieved from the MoS2-PS/PMMA film. The annealing treatment on the MoS2-PS film resulted in the considerable enhancement of its NLO and OL performance. The achieved βeff and OL thresholds were 455.67 cm/GW at 532 nm and 448.90 cm/GW at 1 064 nm; and 1.07 GW/cm2 at 532 nm and 0.87 GW/cm2 at 1 064 nm, respectively.
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