高级检索

    贾会梅, 宛延, 程红霞, 韩梦茹, 张斌, 陈彧. 聚苯乙烯共价修饰的二硫化钼钠米片宽带光限幅功能材料的合成与表征[J]. 功能高分子学报, 2018, 31(1): 28-36. doi: 10.14133/j.cnki.1008-9357.20170607001
    引用本文: 贾会梅, 宛延, 程红霞, 韩梦茹, 张斌, 陈彧. 聚苯乙烯共价修饰的二硫化钼钠米片宽带光限幅功能材料的合成与表征[J]. 功能高分子学报, 2018, 31(1): 28-36. doi: 10.14133/j.cnki.1008-9357.20170607001
    JIA Hui-mei, WAN Yan, CHENG Hong-xia, HAN Meng-ru, ZHANG Bin, CHEN Yu. Synthesis and Characterization of Polystyrene Covalently Modified MoS2 Broadband Optical Limiting Functional Material[J]. Journal of Functional Polymers, 2018, 31(1): 28-36. doi: 10.14133/j.cnki.1008-9357.20170607001
    Citation: JIA Hui-mei, WAN Yan, CHENG Hong-xia, HAN Meng-ru, ZHANG Bin, CHEN Yu. Synthesis and Characterization of Polystyrene Covalently Modified MoS2 Broadband Optical Limiting Functional Material[J]. Journal of Functional Polymers, 2018, 31(1): 28-36. doi: 10.14133/j.cnki.1008-9357.20170607001

    聚苯乙烯共价修饰的二硫化钼钠米片宽带光限幅功能材料的合成与表征

    Synthesis and Characterization of Polystyrene Covalently Modified MoS2 Broadband Optical Limiting Functional Material

    • 摘要: 利用原位聚合方法将聚苯乙烯(PS)共价接枝到二硫化钼纳米片表面,获得的材料MoS2-PS能均匀地分散在常见的有机溶剂中。开孔Z-扫描实验结果表明:与MoS2、MoS2/PS相比,MoS2-PS的N,N-二甲基甲酰胺(DMF)溶液及其聚甲基丙烯酸甲酯(PMMA)薄膜样品均表现出更好的非线性光学性能。相对于溶液,在532 nm和1 064 nm激光激发时,MoS2-PS/PMMA固体薄膜表现出最大的非线性吸收系数(βeff),分别达到407.70 cm/GW(MoS2-PMMA:100.69 cm/GW;MoS2/PS/PMMA:116.55 cm/GW)和429.64 cm/GW(MoS2-PMMA:-48.92 cm/GW;MoS2/PS/PMMA:66.31 cm/GW);相应的光限幅阈值分别为0.92 GW/cm2(532 nm)和1.12 GW/cm2(1 064 nm)。MoS2-PS/PMMA固体薄膜经200℃退火处理后,βeff和光限幅性能得到增强(βeff分别为455.67 cm/GW和448.90 cm/GW;光限幅阈值分别为1.07 GW/cm2和0.87 GW/cm2)。

       

      Abstract: New soluble MoS2 nanosheets covalently functionalized with polystyrene (PS), MoS2-PS, was in situ synthesized. The open-aperture Z-scan results demonstrated that both the solution of MoS2-PS in DMF and the MoS2-PS/PMMA film showed superior nonlinear optical (NLO) and optical limiting (OL) responses when compared to MoS2 and MoS2/PS blends. The thin films had a much higher concentration than the solutions at the same level of linear transmission, resulting in a much larger βeff. In particular, for the MoS2-PS/PMMA film, βeff were 407.70 cm/GW at 532 nm (100.69 cm/GW for MoS2-PMMA and 116.55 cm/GW for MoS2/PS/PMMA) and 429.64 cm/GW at 1 064 nm (-48.92 cm/GW for MoS2-PMMA and 66.31 cm/GW for MoS2/PS/PMMA). A larger OL effect, with thresholds of about 0.92 GW/cm2 at 532 nm and about 1.12 GW/cm2 at 1 064 nm, was also achieved from the MoS2-PS/PMMA film. The annealing treatment on the MoS2-PS film resulted in the considerable enhancement of its NLO and OL performance. The achieved βeff and OL thresholds were 455.67 cm/GW at 532 nm and 448.90 cm/GW at 1 064 nm; and 1.07 GW/cm2 at 532 nm and 0.87 GW/cm2 at 1 064 nm, respectively.

       

    /

    返回文章
    返回