Abstract: A non-close-packed hemispherical azobenzene homopolymer (refered as azopolymer) hexagonal array micropattern was obtained by using the self-assembly of polystyrene colloidal spheres, reactive ion etching and polydimethylsiloxane soft lithography. The structure and wettability of microarray surface was characterized by FESEM, AFM and contact angle meter. The influence of irradiation on micropattern structure and wettability of the film was studied. Under irradiation of a linearly polarized light, the micropattern of azopolymer film deformed from original hemisphere array to spindle-like array and ellipsoid-like array. It's a result of the photo-induced orientation from azobenzene moieties. The deformed microstructures change the surface wettability of the films, which realize the photo-control of different micropatterns and wettability on the surface of azopolymer films.